Chinese fab SMIC’s 7nm metal pitch beats Intel 18A but lags 38% on density, teardown finds — Huawei’s sanctions-beating HiSilicon Kirin 9030 is the first subject of SemiAnalysis’s new teardown lab


SemiAnalysis has published the first teardown from its new in-house lab, focusing on the minimum local metal pitch on SMIC’s third-gen 7nm at 32.5nm, tighter than the 36nm pitch shipping in Intel’s Panther Lake chips on 18A. The analysis was conducted on a HiSilicon Kirin 9030, the processor found inside Huawei’s Mate 80 phones and built on the N+3 process, which SemiAnalysis says trails Intel’s 18A high-density library by 38%. The SemiAnalysis Teardown Engineering & Evaluation Lab (STEEL) has been opened in Hillsboro, Oregon, and built to take on TechInsights in advanced-node reverse engineering.

A 36nm pitch is what Panther Lake ships with, but the 18A process on the whole supports a 32nm minimum metal pitch. With Panter Lake, Intel opted to relax the pitch because routing power through the back of the wafer — via PowerVia — clears the front-side metal stack for signal wiring.

HiSilicon Kirin 9030 die annotation

(Image credit: SemiAnalysis)

Intel has said doing this buys roughly 10% higher density and looser front-side pitches, which is how a node built on GAA RibbonFET transistors and backside power can ship a wider local pitch than a DUV Chinese process and maintain a wide overall lead. SMIC reached 32.5nm without EUV lithography, leaning on DUV tools and quadruple-patterning that needs extra masking and etch passes.

Latest Videos From



Source link

About Author /

Start typing and press Enter to search

×

Login

Enable Notifications OK No thanks